The Low Temperature Resistivity of Mn-Ni Films


Measurements on electrical resistivity of thermally evaporated Mn100-x Nix films (with x = 0.5, 1.5 and 2.5 at. %) have been carried out over the temperature range from 300 to 1.4 K using the van der Pauw four probe technique. The films were grown on a glass substrate held at a temperature of 300 K in an ambient pressure of 2 x l0-6 torr. All the films show the usual resistance minimum, a notable characteristic of α-Mn but their low temperature behavior reveal a tendency towards saturation of the resistivity as the temperature approaches zero. This saturation is reminiscent of the Kondo effect.



Ampong, F. K.( College of Science, Lecturer , 0322060307)
Boakye, F.


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This article was published by Nova Science Publishers in 2011.

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